SEMI Grade5 For 14nm and further technology node
| NAME | APPLICATION |
| H2O2 | Widely used in the semiconductor front wet cleaning process, including the cleaning of particles, metal impurities and organic residues |
| H2SO4 | Removing photoresist and other organic residues |
| NH4OH | Removing water particle and cleaning polymer |
| NH4F·HF | Etchant of silicon oxide used in wet etching process |
| HNO3 | Applied in water recycling and cleaning process |
| HCI | Applied in metal ion impurity removing process |
| C4H13NO | Applied in water thinning process and also universal developer of photoresist |
【W(wǎng)eChat】 Copyright ? 2012-2025 Crystal Clear Electronic Material Co.,Ltd.蘇ICP備05007813號(hào)
Technical：EEEKEJI
Hotline：4000-300655
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Copyright ? 2012-2025 Crystal Clear Electronic Material Co.,Ltd.
Technical：EEEKEJI
4000-300655